Keywords

• Knittex FA
• EINECS 224-431-0
• For KrF, ArF photoresist production

Quick Details

• ProName: 1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY- ...
• CasNo: 4356-60-9
• Molecular Formula: C9H18N2O5
• Application: For KrF, ArF photoresist production
• Port: Shanghai
• ProductionCapacity: 1 Metric Ton/
• Purity: 99.0%min
• LimitNum: 100

Superiority

Product Application: 1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY-2-IMIDAZOLIDINONE (CAS: 4356-60-9)

1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY-2-IMIDAZOLIDINONE is a highly specialized intermediate compound used in the production of advanced semiconductor materials and photoresists. Due to its unique chemical structure, it plays a crucial role in enhancing the performance of photoresist formulations, especially in photolithography processes that are critical to semiconductor manufacturing.

Key Applications:

1. Semiconductor Materials Intermediate
   This compound is a key intermediate in the development of semiconductor materials used in integrated circuits (ICs) and microelectronics. It aids in improving the precision and efficiency of photolithography processes, which are essential in the production of advanced semiconductor devices.

2. Photoresist Monomer
   1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY-2-IMIDAZOLIDINONE is used as a photoresist monomer in the production of photoresists for KrF (Krypton Fluoride) and ArF (Argon Fluoride) excimer lasers. These photoresists are key components in photolithography, a process widely used in semiconductor fabrication to pattern fine details on silicon wafers.

3. Photogenerated Acid Agent (PAG)
   This compound functions as a photogenerated acid agent (PAG), which is essential for acid-catalyzed reactions in photoresist materials. Upon exposure to ultraviolet light, it generates acids that are crucial for the development and patterning of photoresist films. The KrF and ArF lasers, commonly used in advanced photolithography, are optimized with photoresists containing this compound, providing high resolution and precision for next-generation semiconductor devices.

4. Photolithography Applications
   The compound is critical for photoresist formulations used in both KrF and ArF photolithography processes. These processes are used in the manufacture of ultra-high-density integrated circuits, memory devices, and other semiconductor products. The use of 1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY-2-IMIDAZOLIDINONE ensures excellent resolution and sensitivity, making it an essential component in the production of advanced semiconductor devices.

Summary:
1,3-BIS(METHOXYMETHYL)-4,5-DIMETHOXY-2-IMIDAZOLIDINONE (CAS: 4356-60-9) is an essential chemical intermediate and photogenerated acid agent used in the development of photoresists for advanced semiconductor applications. Its role in KrF and ArF photolithography enhances the precision, resolution, and performance of semiconductor devices, making it indispensable in the high-tech manufacturing processes of modern electronics.

Details